Structural, optical and electrical peculiarities of r.f. plasma sputtered indium tin oxide films
作者： Sylvia Boycheva , Anna Krasilnikova Sytchkova , Maria Luisa Grilli , Angela Piegari
DOI: 10.1016/J.TSF.2007.03.165
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摘要: Abstract In this work the influence of deposition conditions on structural, electrical and optical properties ITO films was studied. Films were deposited by r.f. plasma sputtering technique in Ar varying Ar + O 2 gas mixtures, with without substrate heating. Transmittance reflectance measured range 350–2500 nm; refractive index ( n ) extinction coefficient k calculated spectral data simulation. The sheet resistance four-point probe method. X-ray diffraction analysis performed to study texture films. Threshold behaviour observed atmosphere at a certain oxygen concentration determined fix combination all other conditions. A schematic diagram for change film versus composition suggested, which explains obtained results.
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