Formation of nanocrystalline NiCr–N films by reactive dc magnetron sputtering
作者： J. Musil , F. Regent
DOI: 10.1116/1.581537
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摘要: The article reports on structure and hardness of NiCr–N films prepared by dc reactive magnetron sputtering NiCr (80/20 wt. %) target in a mixture Ar N2 glass 15 330 steel substrates at room temperature using round planar diameter 75 mm. It was found that while pure are polycrystalline, an addition nitrogen into the film reduces grain size d makes it possible to form nanocrystalline films. HV increases with decreasing but only down about 7 nm. For grains smaller than nm decreases.
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