作者: LW Ji , Yan-Kuin Su , Shoou-Jinn Chang , SH Liu , CK Wang
DOI: 10.1016/S0038-1101(03)00159-X
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摘要: Abstract Nanometer-scale InGaN self-assembled quantum dots (QDs) have been prepared by growth stop during the metal-organic chemical vapor deposition growth. With a 12 s interruption, we successfully formed QDs with typical lateral size of 25 nm and an average height 4.1 nm. The density was about 2 × 1010 cm−2. Nitride-based QD metal–semiconductor–metal (MSM) photodetectors were also fabricated. It found that could significantly enhance photocurrent to dark current contrast ratio MSM use structure.