RF 마그네트론 스퍼터로 증착된 In2O3 박막의 질소분위기 열처리에 따른 특성변화
作者： Young-Min Kong , Young-Jin Lee , Sung-Bo Heo , Hak-Min Lee , Min-Su Seo
DOI: 10.3740/MRSK.2012.22.1.024
关键词:
摘要: In2O3 films were deposited by RF magnetron sputtering on a glass substrate and then the effect of post depositionannealing in nitrogen atmosphere structural, optical electrical properties was investigated. Afterdeposition, annealing process conducted for 30 minutes at 200 400oC. XRD pattern analysis showed that asdeposited amorphous. When temperature reached 200-400oC, intensities (222) majorpeak increased full width half maximum (FWHM) peak decreased due to crystallization. Thefilms annealed 400oC grain size 28nm, which larger than as amorphous films. Theoptical transmittance visible wavelength region also increased, while sheet resistance decreased. In this study,the highest 76% lowest of89Ω/□. The figure merit 7.2×10−4Ω−1 annealingon work-function considered. obtained from 7.0eV. Thus,the are an alternative ITO use transparent anodes OLEDs.
cheric.org参考文章(9)
Daeil Kim, Influence of CuSn thickness on the work function and optoelectrical properties of ZnO/CuSn/ZnO multilayer films Displays. ,vol. 31, pp. 155- 159 ,(2010) , 10.1016/J.DISPLA.2010.05.002
Chang-Sik Son, Effect of Deposition Temperature on Structural and Electrical Properties of Ga-Doped ZnO for Transparent Electrode of Thin Film Solar Cells Korean Journal of Materials Research. ,vol. 21, pp. 144- 148 ,(2011) , 10.3740/MRSK.2011.21.3.144
V. Senthilkumar, P. Vickraman, Annealing temperature dependent on structural, optical and electrical properties of indium oxide thin films deposited by electron beam evaporation method Current Applied Physics. ,vol. 10, pp. 880- 885 ,(2010) , 10.1016/J.CAP.2009.10.014
Daeil Kim, Characterization of TiO2/Au/TiO2 films deposited by magnetron sputtering on polycarbonate substrates Applied Surface Science. ,vol. 257, pp. 704- 707 ,(2010) , 10.1016/J.APSUSC.2010.07.038
V. Korobov, M. Leibovitch, Yoram Shapira, Structure and conductance evolution of very thin indium oxide films Applied Physics Letters. ,vol. 65, pp. 2290- 2292 ,(1994) , 10.1063/1.112721
Frederick Ojo Adurodija, Lynne Semple, Ralf Brüning, Real-time in situ crystallization and electrical properties of pulsed laser deposited indium oxide thin films Thin Solid Films. ,vol. 492, pp. 153- 157 ,(2005) , 10.1016/J.TSF.2005.07.114
Hiroshi Morikawa, Miya Fujita, Crystallization and electrical property change on the annealing of amorphous indium-oxide and indium-tin-oxide thin films Thin Solid Films. ,vol. 359, pp. 61- 67 ,(2000) , 10.1016/S0040-6090(99)00749-X
G. Haacke, New figure of merit for transparent conductors Journal of Applied Physics. ,vol. 47, pp. 4086- 4089 ,(1976) , 10.1063/1.323240
Jun-Ho Kwak, Shin-Ho Cho, 라디오파 반응성 마그네트론 스퍼터링으로 증착된 In₂O₃ 박막의 특성에 산소 유량비의 변화가 미치는 효과 Applied Science and Convergence Technology. ,vol. 19, pp. 224- 229 ,(2010) , 10.5757/JKVS.2010.19.3.224