Flash grafting of functional random copolymers for surface neutralization

摘要: Tailoring surface energies is the key factor to control orientation of nanoscopic structures in thin block copolymer (BCP) films. In general frame “grafting to” approach, this paper reports on use Rapid Thermal Processing (RTP) technology perform flash grafting reactions a hydroxyl terminated poly(styrene-r-methylmethacrylate) random activated silicon wafer surface. The perpendicular cylindrical morphology an asymmetric PS-b-PMMA achieved when thickness layer higher than 6.0 nm. time achieve reduces from about 750 s, RTP process performed at 230 °C, 15 s 310 °C. For symmetric copolymer, perpendicularly oriented lamellar obtained 3.5 nm, that after 60 250 addition, TGA-GC-MS analysis indicates chain structural reorganization, which occurs during treatment high temperature, affords more stable film structure without changing its characteristics. conclusion, allows approach be successfully integrated into next generation lithographic processes and unprecedented opportunity study macromolecules scales temperature ranges have never been explored before, shedding new light early stages dynamics these processes.