脉冲偏压电弧离子镀制备C1-x-yNxZry超硬复合薄膜
作者： Hong-Kai LI , Guo-Qiang LIN , Chuang DONG
DOI: 10.3724/SP.J.1077.2010.00517
关键词:
摘要: 用脉冲偏压电弧离子镀方法在保持石墨靶弧流恒定的条件下, 通过同步改变锆靶弧流与氮流量,在硬质合金基体上制备了一系列不同成分的C 1- x-y N x Zr y 复合薄膜. 随着锆靶弧流与N流量增加, 薄膜中Zr与N含量都呈线性增加, 同时C含量快速减少. Raman光谱显示所制备的薄膜具有DLC特征, 而XRD结果显示薄膜中还存在有明显的ZrN晶体相, 说明本实验所制备的薄膜属于在DLC非晶基体上匹配有ZrN晶体相的碳基复合薄膜. 随Zr与N含量增加，薄膜硬度先增大后降低, 当 =0.19, =0.28时薄膜具有最高硬度值, 为43.6GPa, 达到了超硬薄膜的硬度值.
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