Purging of porogen from uv cure chamber
作者： Stephen Yu-Hong Lau , Ming Xi , Eugene Smargiassi , George D. Kamian
DOI:
关键词:
摘要: A purge ring for providing a gas to wafer processing chamber includes an inlet wall defining hole space. An outer perimeter of the is elliptical. space circular. The continuous structure surrounding baffle formed within surrounds at least 180 degrees plenum arranged in first end provides through baffle. exhaust channel second wall. outlet exhausts out via channel.
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