Rapid thermal processing chamber with shower head
作者： Joseph Michael Ranish , Wolfgang Aderhold , Alexander N. Lerner , Aaron Muir Hunter , Khurshed Sorabji
DOI:
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摘要: Apparatus and methods for thermally processing a substrate are provided. A chamber containing levitating support assembly configured to position the at different distances from plate during heating cooling of substrate. In one embodiment plurality openings on surface evenly distribute gas across radial The distribution may couple radiant energy not reflected back thermal with an absorptive region begin method apparatus provided within allows controllable effective means rapidly.
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