Amorphous Ta–Si–N thin‐film alloys as diffusion barrier in Al/Si metallizations
作者： E. Kolawa , J. M. Molarius , C. W. Nieh , M.‐A. Nicolet
DOI: 10.1116/1.576620
关键词:
摘要: … We report on properties of amorphous Ta-Si-N alloys as diffusion barriers between Al and Si… of amorphous Ta-Si-N films interposed between a (Si) substrate and an Al overlayer (Si/Ta-…
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