作者: F. Matsukura , H. Ohno , H. Gan , K. Miura , S. Ikeda
DOI: 10.1063/1.3265740
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摘要: The authors studied an effect of ferromagnetic (Co20Fe60B20 or Fe) layer insertion on tunnel magnetoresistance (TMR) properties MgO-barrier magnetic junctions (MTJs) with CoFe/Pd multilayer electrodes. TMR ratio in MTJs CoFeB/MgO/Fe stack reached 67% at annealing temperature (Ta) 200 °C and then decreased rapidly Ta over 250 °C. degradation the may be related to crystallization CoFe(B) into fcc(111) bcc(011) texture resulting from diffusion B Pd layers. which were situ annealed 350 °C just after depositing bottom showed 78% by postannealing Ta=200 °C.