XPS investigation of the oxidation of Hg1-xCdxTe surfaces

摘要: X‐ray photoelectron spectroscopy (XPS) was employed to characterize the oxidation of Hg1−xCdxTe surfaces. Surfaces investigated included those treated with a standard Br‐methanol etch and atomically clean surfaces produced by low‐energy ion bombardment. The latter type were exposed controlled amounts dry oxygen laboratory ambient. main observation on all preferential TeO2 formation at surface. Oxidation under conditions found proceed very slowly. Some simple organic acids. These upon exposure ambient for several weeks exhibited little or no growth.