An effect of annealing on In implanted ZnO

作者: I. Sakaguchi , D. Park , Y. Takata , S. Hishita , N. Ohashi

DOI: 10.1016/S0168-583X(03)00706-7

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摘要: Abstract The behavior of In implants, 170 keV, 1 × 1016 ions/cm2, in ZnO after annealing was investigated the temperature range 750–850 °C. depth profiles reveal anomalous due to plateau region profiles. diffusion coefficients were estimated from profiles, and dependence described as D [ cm 2 / s ]=1.1 exp (−259±17 kJ mol ]/RT) . feature resulted complex defects formed by radiation damages. leads an intense emission at around 525 nm photoluminescence spectrum. This is related oxygen vacancy.

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