Adhesion assessment of silicon carbide, carbon, and carbon nitride ultrathin overcoats by nanoscratch techniques

作者: Hong Deng , Thomas W. Scharf , John A. Barnard

DOI: 10.1063/1.364551

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摘要: This paper presents experimental results for adhesion assessment of 20 nm ultrathin SiC, amorphous carbon and nitride films deposited on silicon (111) substrates by sputtering. In the experiment, overcoats were scratched a face-forward Berkovich diamond indenter with continuous depth sensing nanoscratch system. Experimental indicate that system has very good sensitivity detecting overcoat cracking, delamination, brittle fracture caused scratching. A well-defined critical load each film was determined techniques. The highest (800 μN) is found CN lowest (500 SiC. Scanning electron microscopy (SEM) investigations to surface damage samples reveal SiC damaged more severely than other due its fracture. properties three tested in this work are best nitride, followed ...

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