Nanoindentation / Nanoscratching and Stress Studies in Monolithic and Nanolayered Amorphous Carbon Films

摘要: We have recently reported that monolithic amorphous carbon (a-C) films deposited by RF magnetron sputtering exhibit a high level of sp3 sites when negative bias voltage (Vb) is applied onto the substrate. This type a-C are dense (~2.65 g/cm3), hard (>20 GPa) and highly stressed (6-7 GPa). The latter, however, limits their thickness below to ~40 nm. Thus, we developed nanolayer structured thick with alternating Vb (positive/negative) which stable, rich in content. Nanoindentation low load scratch test results demonstrate layers sp2 content promote stress relaxation during compositional rearrangement layer deposited. Possible explanations on origin enhancement elastic properties nanolayered proposed discussed based formation smooth interfaces between two different types layers.