Hydrogen plasma diagnosis in penning ion source by optical emission spectroscopy

作者: Da-Zhi Jin , Zhong-Hai Yang , Ping-Ying Tang , Kun-xiang Xiao , Jing-yi Dai

DOI: 10.1016/J.VACUUM.2008.05.009

关键词:

摘要: Abstract Penning-type discharge plasma ion source is a kind of powerful device applied widely in many fields. In this paper, optical emission spectroscopy (OES) measurement carried out to diagnose the parameters hydrogen miniature penning-type source. The relative intensity neutral atomic spectral lines used evaluate electron temperature plasma. experiment results indicate that Balmer-α, Balmer-β and Balmer-γ exhibits significant dependence on filling gas pressure about 1.5–3 eV range current 30–180 μA when anode voltage fixed at 1.4 kV.

参考文章(7)
Richard H. Huddlestone, Stanley L. Leonard, Harold P. Furth, Plasma diagnostic techniques ,(1965)
A. Qayyum, R. Ahmad, S.A. Ghauri, A. Waheed, M. Zakaullah, Hydrogen Balmer-β and Balmer-γ emission profiles in an abnormal glow region of hydrogen plasma Vacuum. ,vol. 80, pp. 574- 580 ,(2006) , 10.1016/J.VACUUM.2005.09.007
C. Heise, J. Hollandt, R. Kling, M. Kock, M. Kühne, Radiometric characterization of a Penning discharge in the vacuum ultraviolet. Applied Optics. ,vol. 33, pp. 5111- 5117 ,(1994) , 10.1364/AO.33.005111
Feng Xian-Ping, D Andruczyk, B W James, K Takiyama, S Namba, T Oda, Effects of discharge current and voltage on the high density of metastable helium atoms Chinese Physics. ,vol. 12, pp. 495- 501 ,(2003) , 10.1088/1009-1963/12/5/306
A. QAYYUM, S. ALI SHAN, M. ZAKAULLAH, A. WAHEED, EFFECT OF PLASMA OXIDE SURFACE COATING OF ELECTRODES ON IMPURITY LEVEL AND PLASMA PARAMETERS International Journal of Modern Physics B. ,vol. 18, pp. 1687- 1696 ,(2004) , 10.1142/S0217979204025002
T. G. Snodgrass, J. H. Booske, A. E. Wendt, Z. C. Lu, J. E. Foster, Measurement of electron energy distribution function in an argon/copper plasma for ionized physical vapor deposition Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 17, pp. 840- 844 ,(1999) , 10.1116/1.581656
U Fantz, Basics of plasma spectroscopy Plasma Sources Science and Technology. ,vol. 15, ,(2006) , 10.1088/0963-0252/15/4/S01