作者: A.N. Baranov , S.G. Konnikov , T.B. Popova , V.E. Umansky , Yu.P. Yakovlev
DOI: 10.1016/0022-0248(84)90153-2
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摘要: Abstract Ga 1− x Al Sb y As /GaSb epitaxial layers were grown at a temperature of about 550°C. Arsenic was introduced into the melt same from InAs or GaAs source wafers. It found that content in Ga-Al-Sb-Sb-As did not depend on initial concentration when liquid phase formed by saturating Ga-Al-Sb wafer. When wafers used for melt, fraction decreased with an increase concentration. has been demonstrated strain due to lattice mismatch between substrate and solid equilibrium changes conditions can result stabilization composition melt.