Laser plasma sources of soft x-rays and extreme ultraviolet (EUV) for application in science and technology

摘要: ABSTRACT Laser plasma sources of soft x-rays an d extreme ultraviolet (EUV) developed in our laboratory for application various areas technology and science are presented. The based on a laser-irradiated gas puff target approach. targets formed by pulsed injection under high-pressure irradiated with nanosecond laser pulses from Nd:YAG lasers. We use commercial lasers generating time duration 1ns to 10ns energies 0.5J 10J at 10Hz repetition rate. produced using double valve system equipped special nozzle form double-stream which secures high conversion efficiency without degradation the nozzle. instead solid makes generation plasmas emitting EUV possible debris production. optical systems, including grazing incidence axisymmetric ellipsoidal mirrors, “lobster eye” type multi-foil mirror, mirror Mo/Si multilayer coating, collect so ft x-ray radiation beams. In this paper new applications these fields, imaging nanoscale, radiography tomography, materials processing modification polymer surfaces, photoionization gases, radiobiology contact microscopy reviewed. Keywords: plasmas, x-rays, (EUV), sources, microscopy, materials, radiobiology, photo-ionized