Localized dealloying corrosion mediated by self-assembled monolayers used as an inhibitor system

摘要: The structure and chemistry of thiol or selenol self-assembled organic monolayers have been frequently addressed due to the unique opportunities in functionalization materials. Such films can also act as effective inhibition layers mitigate oxidation corrosion. Cu–Au alloy substrates covered by show a different dealloying mechanism compared bare surfaces. surface layer inhibits noble metal alloys suppression diffusion at lower potentials but higher applied proceeds localized regions passivity breakdown. We present an situ atomic force microscopy study patterned on surfaces further explore approaches change local composition exchange molecules. pattern for experiment has micro-contact printing. This allows corrosion protection with its dependence molecule densities sites. Low-density areas surrounding high-density patterns are completely protected initiation only along lowest inhibitor concentration. Dealloying highly influenced controlled molecular affected introducing structural defects such scratches polishing defects.