Transparent conductive layer forming method, transparent conductive layer formed by the method, and material comprising the layer

作者: Takakazu Kiyomura , Toshio Tsuji , Hiroto Itoh

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摘要: A transparent conductive layer forming method is disclosed which comprises the steps of introducing a reactive gas to discharge space, exciting in plasma state by at atmospheric pressure or approximately pressure, and exposing substrate form on substrate, wherein reducing gas.

参考文章(20)
Steve E. Babayan, Robert F. Hicks, Gary S. Selwyn, Deposition of coatings using an atmospheric pressure plasma jet ,(1998)
Wataru Mizuno, Yoshiro Toda, Yoshikazu Kondo, Kiyoshi Oishi, Koji Fukazawa, Kazuhiro Fukuda, Akira Nishiwaki, Plasma treatment method at atmospheric pressure ,(2002)
Hitoshi Mikoshiba, Toshiaki Yatabe, Isao Shiroishi, Toru Hanada, Liquid crystal display component and transparent conductive substrate suitable for the same ,(1999)
Hitoshi Mikoshiba, Haruhiko Itoh, Yuji Tamura, Transparent electroconductive laminate ,(2002)
Zhang Zhaochun, Huang Baibiao, Yu Yongqin, Cui Deliang, Electrical properties and Raman spectra of undoped and Al-doped ZnO thin films by metalorganic vapor phase epitaxy Materials Science and Engineering B-advanced Functional Solid-state Materials. ,vol. 86, pp. 109- 112 ,(2001) , 10.1016/S0921-5107(01)00522-0
Tadatsugu Minami, Takashi Yamamoto, Toshihiro Miyata, Highly transparent and conductive rare earth-doped ZnO thin films prepared by magnetron sputtering Thin Solid Films. ,vol. 366, pp. 63- 68 ,(2000) , 10.1016/S0040-6090(00)00731-8
T Minami, T Kakumu, Y Takeda, S Takata, Preparation of transparent conducting Zn2In2O5 films by d.c. magnetron sputtering Thin Solid Films. ,vol. 317, pp. 326- 329 ,(1998) , 10.1016/S0040-6090(97)00548-8