作者: Matthieu Bilaine , Emmanuel Mimoun
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摘要: The subject of the invention is a process for obtaining substrate provided on at least one portion its sides with coating, comprising step depositing said coating substrate, then heat treatment using pulsed or continuous laser radiation focused in form line, wavelength which within range extending from 400 to 1500 nm, being such that relative displacement movement created between and each speed 3 meters per minute, line having beam quality factor (BPP) most mm·mrad and, measured place where linear power density divided by square root duty cycle 200 W/cm, length 20 mm width distribution along mean 30 micrometers difference largest smallest 15% value width.