A Derivation of Ion Energy Distribution Function for Dual Frequencies Capacitively Coupled Plasma

作者: Zhu Wen Zhou , De Liang Chen , Bo Kong , Yuan Sheng Wang

DOI: 10.4028/WWW.SCIENTIFIC.NET/AMM.513-517.4253

关键词:

摘要: A model of ion energy distribution dual frequencies capacitively coupled plasma (CCP) has been investigated, it is important to analyze these phenomenon and mechanism in order control the microelectronic processes integrated circuit develop base theories physics. We focused on function distributions under high low (dual frequencies) drive capacitive discharges, we derived a theory driven IEDs from analyzing theories. The can predict different driven, which results accurate multi-peaks width for given parameters, particle-in-cell (PIC) simulations are used verify this model.

参考文章(12)
Pierre Benoit‐Cattin, Louis‐Christian Bernard, Anomalies of the Energy of Positive Ions Extracted from High‐Frequency Ion Sources. A Theoretical Study Journal of Applied Physics. ,vol. 39, pp. 5723- 5726 ,(1968) , 10.1063/1.1656039
D. Israel, K.-U. Riemann, L. Tsendin, Charge exchange collisions and ion velocity distribution at the electrode of low pressure capacitive rf discharges Journal of Applied Physics. ,vol. 99, pp. 093303- ,(2006) , 10.1063/1.2191622
Alan C. F. Wu, M. A. Lieberman, J. P. Verboncoeur, A method for computing ion energy distributions for multifrequency capacitive discharges Journal of Applied Physics. ,vol. 101, pp. 056105- ,(2007) , 10.1063/1.2435975
Zhuwen Zhou, Rongfeng Linghu, Mingsen Deng, Deyong Xiong, An analytical model of computing ion energy distributions for multiple frequencies capacitive discharges Journal of Applied Physics. ,vol. 112, pp. 063306- ,(2012) , 10.1063/1.4754447
J K Lee, O V Manuilenko, N Yu Babaeva, H C Kim, J W Shon, Ion energy distribution control in single and dual frequency capacitive plasma sources Plasma Sources Science and Technology. ,vol. 14, pp. 89- 97 ,(2005) , 10.1088/0963-0252/14/1/012
Michael A. Lieberman, Allan J. Lichtenberg, Principles of Plasma Discharges and Materials Processing John Wiley & Sons, Inc.. ,(2005) , 10.1002/0471724254
W. C. Chen, X. M. Zhu, S. Zhang, Y. K. Pu, Reconstruction of ion energy distribution function in a capacitive rf discharge Applied Physics Letters. ,vol. 94, pp. 211503- ,(2009) , 10.1063/1.3147216
E Kawamura, V Vahedi, M A Lieberman, C K Birdsall, Ion energy distributions in rf sheaths; review, analysis and simulation Plasma Sources Science and Technology. ,vol. 8, ,(1999) , 10.1088/0963-0252/8/3/202
Wang Li-Hong, Dai Zhong-Ling, Wang You-Nian, Investigation of Dual Radio-Frequency Driven Sheaths and Ion Energy Distributions Bombarding an Insulating Substrate Chinese Physics Letters. ,vol. 23, pp. 668- 671 ,(2006) , 10.1088/0256-307X/23/3/040