Thin film processing for high-T c superconductors of the Bi-system

作者: Kiyotaka Wasa , Hideaki Adachi , Kumiko Hirochi , Yo Ichikawa , Tomoaki Matsushima

DOI: 10.1557/JMR.1991.1595

关键词:

摘要: Basic thin film deposition processes for controlled of the high- T c superconductors Bi-systems are described. The layered structures Bi-oxide fabricated by a multitarget sputtering process. process realizes single phase superconductors, Bi 2 O · 2SrO ( n −1)CaO CuO = 1 to 5. minimum thickness is half crystal unit-cell around 15 A, and superlattices comprising A k B ) m , where denote with different numbers Cu–O layers, could be > 1, although ion mixing takes place during due bombardment highly energetic sputtered adatoms. Multitarget will available fabrication artificially-made oxide (ALOS).

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