Ferroelectric thin films: Preparation and characterization

摘要: Publisher Summary This chapter presents the growth processes of ferroelectric thin films (both physical and chemical nature), which have received major attention. Almost every technique appears to offer thin-film properties that qualify for extensive research. Recently, attention among community has been focused on gaining a clearer understanding these in close correlation with processing subsequent microstructure films. Also evident work dealing effect chemistry exposing low-energy bombardment during gain better control structure and, subsequently, electrical properties. However, irrespective nature application, following issues require immediate attention: (1) size density, (2) controlled process-composition–microstructure-property correlation, (3) film/substrate interfaces, (4) process dependent defects their distribution, (5) time-dependent performance devices.