Surface kinetics of N and O atoms in discharges

作者: B Gordiets , C M Ferreira , J Nahorny , D Pagnon , M Touzeau

DOI: 10.1088/0022-3727/29/4/012

关键词:

摘要: The probability, , of losses N and O atoms on Pyrex walls was determined from a fit calculated to measured concentrations [O] [NO] in low-pressure glow discharge for percentage . kinetic model used calculations includes detailed description the processes occurring bulk surface reactions atoms. It found that are functions ratio wall temperature, values were increase about as increases 1% 90% (corresponding ). probability be independent depend only range For however, depends its magnitude increasing by factor 2 - 5 developed here provides closed expressions terms rate constants activation energies these reactions. is shown behaviour well explained under following conditions: (i) main low temperatures involved reversible adsorption followed diffusion adatoms active sites, where they may either irreversibly adsorbed or recombine; (ii) there exist two systems with different reaction probabilities.

参考文章(12)
Henry Wise, Bernard J. Wood, Reactive Collisions Between Gas and Surface Atoms Advances in atomic and molecular physics. ,vol. 3, pp. 291- 353 ,(1968) , 10.1016/S0065-2199(08)60175-X
A. Gelb, Shoon K. Kim, Theory of Atomic Recombination on Surfaces The Journal of Chemical Physics. ,vol. 55, pp. 4935- 4939 ,(1971) , 10.1063/1.1675602
L. Magne, H. Coitout, G. Cernogora, G. Gousset, Atomic oxygen recombination at the wall in a time afterglow Journal De Physique Iii. ,vol. 3, pp. 1871- 1889 ,(1993) , 10.1051/JP3:1993247
D Pagnon, J Amorim, J Nahorny, M Touzeau, M Vialle, On the use of actinometry to measure the dissociation in O2 DC glow discharges: determination of the wall recombination probability Journal of Physics D. ,vol. 28, pp. 1856- 1868 ,(1995) , 10.1088/0022-3727/28/9/014
Young C. Kim, Michel. Boudart, Recombination of oxygen, nitrogen, and hydrogen atoms on silica: kinetics and mechanism Langmuir. ,vol. 7, pp. 2999- 3005 ,(1991) , 10.1021/LA00060A016
A R De Souza, C M Mahlmann, J L Muzart, C V Speller, Influence of nitrogen on the oxygen dissociation in a DC discharge Journal of Physics D. ,vol. 26, pp. 2164- 2167 ,(1993) , 10.1088/0022-3727/26/12/012
G. Gousset, M. Touzeau, M. Vialle, C. M. Ferreira, Kinetic model of a DC oxygen glow discharge Plasma Chemistry and Plasma Processing. ,vol. 9, pp. 189- 206 ,(1989) , 10.1007/BF01054280
W. A. Seward, E. J. Jumper, Model for oxygen recombination on silicon-dioxide surfaces Journal of Thermophysics and Heat Transfer. ,vol. 5, pp. 284- 291 ,(1991) , 10.2514/3.262
G�rard Gousset, Pierre Panafieu, Michel Touzeau, Marinette Vialle, Experimental study of a D.C. oxygen glow discharge by V.U.V. absorption spectroscopy Plasma Chemistry and Plasma Processing. ,vol. 7, pp. 409- 427 ,(1987) , 10.1007/BF01030487