Nanoimprint lithography processes for forming nanoparticles
作者： Sidlgata V. Sreenivasan , Frank Y. Xu
DOI:
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摘要: A lithography method for forming nanoparticles includes patterning sacrificial material on a multilayer substrate. In some cases, the pattern is transferred to or into removable layer of substrate, and functional disposed substrate solidified. At least portion then removed expose protrusions layer, pillars are released from yield nanoparticles. other material, The removed,
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