Growth and characterization of strained layers of GaAsxP1−x

作者: M.R. Leys , H. Titze , L. Samuelson , J. Petruzzello

DOI: 10.1016/0022-0248(88)90574-X

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摘要: Abstract This paper discusses the growth and characterisation of thin layers GaAs x P 1− in between GaP. The samples were grown by MOVPE at atmospheric pressure using trimethylgallium, arsine phosphine. incorporation arsenic is treated with thermodynamic model, one adjustable parameter. parameter a function temperature, rate adsorption site size so we propose adsorption/desorption processes on surface determine efficiency group V species. Investigations transmission electron microscopy reveal crystallographic (im)perfection that obtained. By without interruption, compositional changes are achieved level or two monolayers. coherence interfaces tetragonal deformation lattice made visible high resolution TEM. A planar view image layer above critical thickness dislocation network which elastic strain partially relaxed.

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