Synthesis of Bi2SiO5 thin films by confocal dual magnetron sputtering-annealing route
作者： O. Depablos-Rivera , H. Bouyanfif , A. Zeinert , F. Le Marrec , S.E. Rodil
DOI: 10.1016/J.TSF.2019.04.033
关键词:
摘要: Abstract Synthesis of nanocrystalline Bi2SiO5 thin films was achieved using confocal magnetron sputtering from independently driven alpha-Bi2O3 and Si targets. The correct composition obtained by adjusting the power applied to each target, but crystallization after annealing samples in air at 400 °C for 2 h. were systematically characterized grazing angle X-ray powder diffraction (XRD), photoelectron spectroscopy (XPS), Fourier transform infrared Raman UV-VIS transmittance reflectance spectroscopies. XPS analysis annealed samples, indicated that deposited 80 W meanwhile XRD results formation randomly oriented films, substrate used. Contrary commonly reported orthorhombic phase, detailed spectra suggested presented monoclinic structure, which is only slightly different phase due small titling beta angle. optical a direct band gap 3.8 eV, although not transparent light scattering produced rough-porous surface.
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