Showerhead electrode assemblies for plasma processing apparatuses
作者： Thomas R. Stevenson , Anthony de la Llera , Saurabh Ullal
DOI:
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摘要: Showerhead electrode assemblies are disclosed, which include a showerhead adapted to be mounted in an interior of vacuum chamber; optional backing plate attached the electrode; thermal control or at multiple contact points across plate; and least one thermally electrically conductive gasket separating plate, electrode, points. Methods processing semiconductor substrates using also disclosed.
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