Deposition of particulate-free thin films by two synchronised laser sources: effects of ambient gas pressure and laser fluence
作者： E. György , I.N. Mihailescu , M. Kompitsas , A. Giannoudakos
DOI: 10.1016/J.TSF.2003.09.071
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摘要: Abstract The micrometer and sub-micrometer sized particulates present both on the surface inside of pulsed laser deposited thin films structures stand for main drawback method in view technological applications. We applied a two-laser system order to withdraw case Ta TaO x films. targets were irradiated by first UV laser, while second IR was directed parallel target surface, aiming heat evaporate particulates. morphology obtained studied scanning electron microscopy. For films, ambient gas pressure influences, besides size density particulates, their propagation velocity. This turn results variation optimum delay time between ablating pulse. we found that threshold fluence pulse exists, above which completely particulate-free deposited.
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