Pb deposition on I-coated Au(111). UHV-EC and EC-STM studies.

摘要: This article concerns the growth of an atomic layer Pb on Au(111)(√3 × √3)R30°−I structure. The importance this study lies in use underpotential deposition (UPD) as a sacrificial surface-limited redox replacement (SLRR). SLRR reactions are being applied formation metal nanofilms via electrochemical (ALD). UPD is reaction, and if it placed solution ions more noble metal, can occur, but limited by amount present. candidate for any element. It has been used group both Cu Pt nanofilm using ALD. I atom was intended to facilitate annealing during growth. Two distinctly different structures reported, studied situ scanning tunneling microscopy (STM) with flow cell ultrahigh vacuum surface anal...