Electron beam physical vapor deposition apparatus and crucible therefor
作者： David John Wortman , David Vincent Rigney , Rudolfo Viguie , John Douglas Evans , Robert William Bruce
DOI:
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摘要: An electron beam physical vapor deposition (EBPVD) apparatus and a method for using the to produce coating material (e.g., ceramic thermal barrier coating) on an article. The EBPVD generally includes chamber that is operable at elevated temperatures subatmospheric pressures. gun projects into onto within chamber, causing melt evaporate. article supported so vapors of deposit operation enhanced by inclusion crucible supports configured be efficiently cooled as reduce rate which process temperature increases chamber.
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