Vertical load-lock reduced-pressure type chemical vapor deposition apparatus
作者： Yoshinari Matsushita , Kenji Fukumoto , Satoshi Takeda
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摘要: A CVD apparatus having a single loading-unloading chamber that serves as loading in the left and center parts an unloading right parts. Alternately, wafers provisionally stored cassettes are put into taken from auxiliary connected at part. The has sliding bed for slidingly transferring two cassettes, each used temporarily carrying plurality of load cassette table through to reaction table.
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