Method for the manufacture of electromagnetic radiation reflecting devices
作者： Gabriele Barlocchi , Ubaldo Mastromatteo , Pietro Corona , Flavio Villa
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摘要: Method for manufacturing electromagnetic radiation reflecting devices, said method comprising the steps of: a) providing a silicon substrate defined by at least one first free surface, b) forming on surface layer of protective material provided with an opening which exposes region and c)etching means anisotropic agent to remove portion define second inclined in relation surface. Furthermore, is parallel crystalline planes {110} step (c) comprises progressing such that resulting from etching {100} substrate.
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