Micro-opto-mechanical devices fabricated by anisotropic etching of (110) silicon

摘要: Anisotropic etching of (110) silicon is used to fabricate high-aspect-ratio microstructures and electrostatic microactuators suitable for optical applications. The atomically smooth (111) sidewalls resulting from anisotropic provide large-area, optical-quality surfaces. reflectance such surfaces, which can be as mirrors, was measured using a He-Ne laser found nearly the same those mirror-polished surface typical (100) wafer. Thin plates with widths less than 2 mu m were partially transparent (even at value wavelength 632.8 nm) could beam splitters. A novel electrostatically actuated micromirror fabricated by subsequent bonding glass substrate. provides an deflection 0.7 degrees 25 V excitation.