作者: G.Y. Robinson , N.L. Jarvis
DOI: 10.1063/1.1654237
关键词:
摘要: A new diagnostic technique was used to examine the alloying behavior of Ni/Au–Ge Ohmic contact n‐type GaAs. By combining Auger electron spectroscopy with sputter etching, depth‐composition profiles Ni, Au, Ge, Ga, and As were obtained for alloyed unalloyed samples. Gallium out‐diffusion surface accumulation during observed. The degree Ga as well redistribution in region found depend on orientation GaAs substrate. It shown that overlaying Ni film does not cover Au–Ge uniformly alloying.