Effect of AC pulse overshoot on nonlinearity and reliability of selectorless resistive random access memory in AC pulse operation

作者: Sangheon Lee , Jeonghwan Song , Daeseok Lee , Jiyong Woo , Euijun Cha

DOI: 10.1016/J.SSE.2014.11.013

关键词:

摘要: Abstract The effect of AC pulse engineering on the nonlinearity and reliability selectorless resistive random access memory was investigated in order to implement a high-density cross-point array. Applying an bias can induce current overshoot during switching, owing parasitic capacitance resistance measuring equipment. We observed that dependent set pulse, whereas programming/erasing endurance determined by reset pulse. is very sensitive conditions, it degrades device performance reliability. Therefore, shape engineered eliminate resulting from factors achieve reliable memory.

参考文章(14)
Peng Huang, Xiao Yan Liu, Bing Chen, Hai Tong Li, Yi Jiao Wang, Ye Xin Deng, Kang Liang Wei, Lang Zeng, Bin Gao, Gang Du, Xing Zhang, Jin Feng Kang, A Physics-Based Compact Model of Metal-Oxide-Based RRAM DC and AC Operations IEEE Transactions on Electron Devices. ,vol. 60, pp. 4090- 4097 ,(2013) , 10.1109/TED.2013.2287755
Hong-Yu Chen, Shimeng Yu, Bin Gao, Peng Huang, Jinfeng Kang, H.-S. Philip Wong, HfOx based vertical resistive random access memory for cost-effective 3D cross-point architecture without cell selector international electron devices meeting. ,(2012) , 10.1109/IEDM.2012.6479083
Seong-Geon Park, Min Kyu Yang, Hyunsu Ju, Dong-Jun Seong, Jung Moo Lee, Eunmi Kim, Seungjae Jung, Lijie Zhang, Yoo Cheol Shin, In-Gyu Baek, Jungdal Choi, Ho-Kyu Kang, Chilhee Chung, A non-linear ReRAM cell with sub-1μA ultralow operating current for high density vertical resistive memory (VRRAM) international electron devices meeting. ,(2012) , 10.1109/IEDM.2012.6479084
Pang-Shiu Chen, Yu-Sheng Chen, Heng-Yuan Lee, Wenshing Liu, Pei-Yi Gu, Frederick Chen, Ming-Jinn Tsai, Improved endurance in ultrathin Al2O3 film with a reactive Ti layer based resistive memory Solid-state Electronics. ,vol. 77, pp. 41- 45 ,(2012) , 10.1016/J.SSE.2012.05.027
Jiyong Woo, Seonghyun Kim, Wootae Lee, Daeseok Lee, Sangsu Park, Godeuni Choi, Euijun Cha, Hyunsang Hwang, Thermally activated non-linearity of device in resistance-switching memory for cross-point array applications Applied Physics Letters. ,vol. 102, pp. 122115- ,(2013) , 10.1063/1.4799148
B. Chen, Y. Lu, B. Gao, Y.H. Fu, F.F. Zhang, P. Huang, Y.S. Chen, L.F. Liu, X.Y. Liu, J.F. Kang, Y.Y. Wang, Z. Fang, H.Y. Yu, X. Li, X.P. Wang, N. Singh, G. Q. Lo, D. L. Kwong, Physical mechanisms of endurance degradation in TMO-RRAM international electron devices meeting. ,(2011) , 10.1109/IEDM.2011.6131539
Hyung Dong Lee, S. G. Kim, K. Cho, H. Hwang, H. Choi, J. Lee, S. H. Lee, H. J. Lee, J. Suh, S.-O. Chung, Y. S. Kim, K. S. Kim, W. S. Nam, J. T. Cheong, J. T. Kim, S. Chae, E.-R. Hwang, S. N. Park, Y. S. Sohn, C. G. Lee, H. S. Shin, K. J. Lee, K. Hong, H. G. Jeong, K. M. Rho, Y. K. Kim, S. Chung, J. Nickel, J. J. Yang, H. S. Cho, F. Perner, R. S. Williams, J. H. Lee, S. K. Park, S.-J. Hong, Integration of 4F2 selector-less crossbar array 2Mb ReRAM based on transition metal oxides for high density memory applications symposium on vlsi technology. pp. 151- 152 ,(2012) , 10.1109/VLSIT.2012.6242506
K. Kamiya, M. Y. Yang, B. Magyari-Kope, M. Niwa, Y. Nishi, K. Shiraishi, Physics in designing desirable ReRAM stack structure — Atomistic recipes based on oxygen chemical potential control and charge injection/removal international electron devices meeting. pp. 6479078- ,(2012) , 10.1109/IEDM.2012.6479078
Rainer Waser, Masakazu Aono, Nanoionics-based resistive switching memories Nature Materials. ,vol. 6, pp. 833- 840 ,(2007) , 10.1038/NMAT2023
Seonghyun Kim, Xinjun Liu, Jubong Park, Seungjae Jung, Wootae Lee, Jiyong Woo, Jungho Shin, Godeuni Choi, Chumhum Cho, Sangsu Park, Daeseok Lee, Eui-jun Cha, Byoung-Hun Lee, Hyung Dong Lee, Soo Gil Kim, Suock Chung, Hyunsang Hwang, Ultrathin (l10nm) Nb 2 O 5 /NbO 2 hybrid memory with both memory and selector characteristics for high density 3D vertically stackable RRAM applications symposium on vlsi technology. pp. 155- 156 ,(2012) , 10.1109/VLSIT.2012.6242508