Quasi-two-dimensional Ag nanoparticle formation in silica by Xe ion irradiation and subsequent Ag ion implantation
作者： Jun Wang , Guangyi Jia , Xiaoyu Mu , Changlong Liu
DOI: 10.1063/1.4799175
关键词:
摘要: Ag nanoparticles were fabricated in silica by Xe ion irradiation and subsequent implantation, which distributed a depth range from 4.8 to 14.3 nm, rather than dispersed surface of 24.7 nm when no was made advance. In addition, the suppression implants' sputtering loss also evidenced greatly increased content prepared sample. These results are mainly due defect-enhanced in-beam particle growth. Further, formation polycrystalline revealed, whose effect on optical absorption discussed according electron mean-free-path mode.
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