作者: Hiroyuki Tomonaga , Takeshi Morimoto
DOI: 10.1016/S0040-6090(01)01035-5
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摘要: Thin films of indium-tin oxide (ITO) were formed on glass substrate via a chemical solution deposition method. Indium nitrate coordinated with 2,4-pentanedione and ethylene glycol, tin oxalate used as the raw materials coating solution. Composition ratios Sn/In varied between 0 14 mol%. The solutions coated non-alkali using spin-coating process. Then, was fired in air to thermally decompose precursors densify coating. resistivity coatings at 300°C 5.0 Ω cm decreased higher firing temperatures. 700°C 2.8 × 10 -3 cm, which is more than times that ITO by sputtering A post-annealing non-oxidizing atmospheres such vacuum, N 2 , Ar H /Ar after lowered Treatment hydrogen-containing atmosphere particularly effective lowering 6.2 -4 cm. It found decomposition organic residues formation oxygen vacancies promoted hydrogen treatment.