Kinetics of Oxide Film Growth on Metal Crystals: Electron Tunneling and Ionic Diffusion
作者： A. T. Fromhold , Earl L. Cook
关键词:
摘要: Growth rate of oxide and other dielectric contact films on metal crystals computed for ionic diffusion electron tunneling
harvard.edu
sci-hub.se 参考文章(26)
N. F. Mott, The theory of the formation of protective oxide films on metals, II Transactions of the Faraday Society. ,vol. 35, pp. 472- None ,(1940) , 10.1039/TF9403500472
J. Frenkel, On the Electrical Resistance of Contacts between Solid Conductors Physical Review. ,vol. 36, pp. 1604- 1618 ,(1930) , 10.1103/PHYSREV.36.1604
A.T. Fromhold, Kinetics of oxide film growth on metal crystals—I. Journal of Physics and Chemistry of Solids. ,vol. 24, pp. 1081- 1092 ,(1963) , 10.1016/0022-3697(63)90021-0
R. Stratton, Volt-current characteristics for tunneling through insulating films Journal of Physics and Chemistry of Solids. ,vol. 23, pp. 1177- 1190 ,(1962) , 10.1016/0022-3697(62)90165-8
Thomas E. Hartman, Jay S. Chivian, Electron Tunneling Through Thin Aluminum Oxide Films Physical Review. ,vol. 134, pp. 1094- 1101 ,(1964) , 10.1103/PHYSREV.134.A1094
N Cabrera, N F Mott, Theory of the oxidation of metals Reports on Progress in Physics. ,vol. 12, pp. 163- 184 ,(1949) , 10.1088/0034-4885/12/1/308
N. Cabrera, XIV. On the oxidation of metals at low temperatures and the influence of light Philosophical Magazine Series 1. ,vol. 40, pp. 175- 188 ,(1949) , 10.1080/14786444908521716
T. B. Grimley, IV. Metal oxidation and surface structure Discussions of the Faraday Society. ,vol. 28, pp. 223- 228 ,(1959) , 10.1039/DF9592800223
The Gas/Oxide Interface and the Oxidation of Metals Proceedings of The Royal Society A: Mathematical, Physical and Engineering Sciences. ,vol. 234, pp. 405- 418 ,(1956) , 10.1098/RSPA.1956.0045
A. T. Fromhold, Earl L. Cook, Schottky Emission as a Rate-Limiting Factor in Thermal Oxidation of Metals Physical Review Letters. ,vol. 17, pp. 1212- 1216 ,(1966) , 10.1103/PHYSREVLETT.17.1212