From MEMS to nanomachine

作者: Masayoshi Esashi , Takahito Ono

DOI: 10.1088/0022-3727/38/13/R01

关键词:

摘要: Practically applicable microelectromechanical systems (MEMS) and nanomachines have been developed by applying dry processes. Deep reactive ion etching (RIE) of silicon its applications to an electrostatically levitated rotational gyroscope, a fibre optic blood pressure sensor in micro-actuated probes are described. High density electrical feedthrough glass is made using deep RIE electroplating metal. Multi-probe data storage system has the high glass. Chemical vapour deposition (CVD) different materials for MEMS applications; trench-refill SiO2 CVD, microstructures Silicon carbide CVD mold press selective carbon nanotube electron field emitter. Multi-column beam lithography

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