The Behavior of Implanted Xenon When Used as a Marker during the Anodic Oxidation of Aluminum Evidence for an Explanation of a Dose‐Dependant Splitting Effect
作者： J. P. Thomas , M. Fallavier , P. Spender , E. Francois
DOI: 10.1149/1.2129716
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ecsdl.org参考文章(1)
V. B. Singh, L. C. Singh, P. K. Tikoo, Studies on Electrodeposition of Nickel‐Cobalt‐Tungsten Alloys Journal of The Electrochemical Society. ,vol. 127, pp. 590- 596 ,(1980) , 10.1149/1.2129717