Mechanisms of the Deposition of Hydrogenated Carbon Films
作者： Wolfhard Möller , Wolfgang Fukarek , Klaus Lange , Achim von Keudell , Wolfgang Jacob
DOI: 10.1143/JJAP.34.2163
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摘要: The paper reviews the elementary processes during plasma-enhanced chemical vapour deposition of hydrogenated carbon films from methane, with special emphasis on surface which determine growth rate and film structure. Corresponding model calculations are critically discussed in comparison to experimental findings. Whereas a simplified plasma modeling can be performed some reliability, only very limited information is available physical mechanisms determining as well stoichiometry structure deposited films. Proposed models involving widely different yield similar results thus indiscernible experiments. Nevertheless, reasonable fits data obtained using combined plasma-surface model. For formation structure, recent ellipsometric indicate that hydrogen chemistry might play decisive role addition or rather than ion collisional effects.
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E. Vietzke, V. Philipps, K. Flaskamp, P. Koidl, Ch. Wild, The reaction of atomic hydrogen with a-C:H and diamond films Surface and Coatings Technology. ,vol. 47, pp. 156- 161 ,(1991) , 10.1016/0257-8972(91)90277-4
Diamond and diamond-like films and coatings Plenum Press. ,(1991) , 10.1007/978-1-4684-5967-8
F. Jansen, J. Mort, Plasma deposited thin films pdtf. ,(1986)
R. Kleber, K. Jung, H. Ehrhardt, I. Mühling, K. Breuer, H. Metz, F. Engelke, Characterization of the sp2 bonds network in a-C:H layers with nuclear magnetic resonance, electron energy loss spectroscopy and electron spin resonance Thin Solid Films. ,vol. 205, pp. 274- 278 ,(1991) , 10.1016/0040-6090(91)90314-N
Larry E. Kline, Mark J. Kushner, Computer simulation of materials processing plasma discharges Critical Reviews in Solid State and Materials Sciences. ,vol. 16, pp. 1- 35 ,(1989) , 10.1080/10408438908244626