Effect of RF Power on the Formation and Morphology Evolution of ZnO Nanostructured Thin Films
作者： N.D.M. Sin , Mohamad Hafiz Mamat , Mohamed Zahidi Musa , S. Ahmad , A. Abdul Aziz
DOI: 10.4028/WWW.SCIENTIFIC.NET/AMR.576.577
关键词:
摘要: The effect of RF power on the formation and morphology evolution ZnO nanostructured thin films deposited by magnetron sputtering are presented. This project focused electrical, optical structural properties films. variation at 50 watt-250 watt 200 °C glass substrate was investigated. were examined for electrical using two point probe current-voltage (I-V) measurement (Keithley 2400) UV-Vis-NIR spectrophotometer (JASCO 670) respectively. characterized field emission scanning electron microscope (FESEM) (JEOL JSM 7600F) atomic force (AFM) (Park System XE-100). IV indicated that conductivity film show highest. All high UV absorption UV-VIS 670). root means square (rms) roughness about 4 nm measured AFM. image form FESEM observed transformation structure size started to change as increase.
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