Decomposition of CCl4 in an RF discharge?A gas chromatography and time-resolved emission spectroscopy study
作者： H. -J. Tiller , D. Berg , R. Mohr
DOI: 10.1007/BF00568833
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摘要: The decomposition of CCl4 in an rf discharge starts by a very fast electron attachment mechanism $$\begin{gathered} CCl_4 \xrightarrow{{ + e}}(CCl_4^ - ) \to CCl_3 Cl^ \hfill \\ k_0 \end{gathered}$$ A first-order rate constant, (k0 · ne) ≈ 10+2−10+3 s−1, is estimated two-channel time-resolved emission spectroscopy. ability the method to detect change concentrations plasma processes discussed. A steady-state product distribution containing CCl4, C2Cl4, C2Cl6, Cl2, and glow polymer as main products formed via recombination processes. influence power density on this given gas-chromatographic results.
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