Semiconductor manufacturing process for decreasing the optical refelctivity of a metal layer

摘要: A semiconductor manufacturing process for increasing the optical absorptivity and decreasing reflectivity of a metal film in order to reduce effect reflective notching widen exposure window photolithographic patterning. be photopatterned is first deposited on substrate then roughened increase surface area provide an irregular reabsorbing scattered light. Surface roughening may accomplished by dry etching or simple ion bombardment during reverse sputtering process. second layer also upon sputter deposition achieve desired roughness.