Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
作者： S. B. S. Heil , E. Langereis , F. Roozeboom , M. C. M. van de Sanden , W. M. M. Kessels
DOI: 10.1149/1.2344843
关键词:
摘要: … In the hydrogen plasma the atomic hydrogen emission from … the PA-ALD process and compare it to other ALD and PA-ALD … in which the results on growth rate per cycle, impurity content, …
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