Microwave plasma monitoring system for the elemental composition analysis of high temperature process streams

作者: Paul P. Woskov , Daniel R. Cohn , Charles H. Titus , Jeffrey E. Surma

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摘要: Microwave-induced plasma for continuous, real time trace element monitoring under harsh and variable conditions. The sensor includes a source of high power microwave energy shorted waveguide made conductive, temperature capability refractory material communicating with the to generate plasma. is constructed be robust in hot, hostile environment. It an aperture passage gases analyzed spectrometer connected receive light from Provision situ calibration. disperses light, which then by computer. capable making quantitative measurements desired elements, such as heavy metals lead mercury. invention may incorporated into process device implemented example, DC graphite electrode arc furnace. further provides system elemental analysis streams removing particulate and/or droplet samples therefrom entraining gas flow passes through flame. Introduction facilitated suction pump, regulating flow, gravity or combinations thereof.

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