Strain and misorientation in GaAs grown on Si(001) by organometallic epitaxy

作者: S. K. Ghandhi , J. E. Ayers

DOI: 10.1063/1.100020

关键词:

摘要: … Hthe mosaic GaAs is assumed to consist of many subcrystals with … From this we can calculate the paraHel strain and in-plane lattice … If the film is then cooled to room temperature while …

参考文章(4)
J. Ladell, W. Parrish, J. Taylor, Interpretation of diffractometer line profiles Acta Crystallographica. ,vol. 12, pp. 561- 567 ,(1959) , 10.1107/S0365110X59001669
Ishwara B. Bhat, Kshyamasil Patel, Nikhil R. Taskar, John E. Ayers, Sorab K. Ghandhi, X-ray diffraction studies of CdTe grown on InSb Journal of Crystal Growth. ,vol. 88, pp. 23- 29 ,(1988) , 10.1016/S0022-0248(98)90004-5
Seiji Nishi, Hiroki Inomata, Masahiro Akiyama, Katsuzo Kaminishi, Growth of Single Domain GaAs on 2-inch Si(100) Substrate by Molecular Beam Epitaxy Japanese Journal of Applied Physics. ,vol. 24, pp. L391- L393 ,(1985) , 10.1143/JJAP.24.L391
Yuichi Kawamura, Hiroshi Okamoto, Lattice deformation and misorientation of InxGa1−xAs epitaxial layers grown on InP substrates by molecular‐beam epitaxy Journal of Applied Physics. ,vol. 50, pp. 4457- 4458 ,(1979) , 10.1063/1.326441