Lattice deformation and misorientation of InxGa1−xAs epitaxial layers grown on InP substrates by molecular‐beam epitaxy

作者: Yuichi Kawamura , Hiroshi Okamoto

DOI: 10.1063/1.326441

关键词: X-ray absorption spectroscopyEpitaxyMolecular beam epitaxyCondensed matter physicsMisorientationCrystal structureTetragonal crystal systemCrystallographyMaterials scienceLattice (order)Monochromator

摘要: Lattice deformation and misorientation of InxGa1−xAs epitaxial layers grown on InP substrates by molecular‐beam epitaxy is measured from rocking curves an x‐ray double‐crystal monochrometer. It concluded that the are deformed cubic to tetragonal misoriented except in lattice‐matched epilayers. This result suggests substrate lattice has a large influence structure layers.

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