System and method for controlling plasma with an adjustable coupling to ground circuit
作者： Wenli Collison , Tuqiang Ni
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摘要: A system and method for controlling plasma. The includes a semiconductor chamber comprising powered electrode, another an adjustable coupling to ground circuit. electrode is configured receive wafer or substrate. There at least one grounded generate electrical connection with the electrode. At of electrodes electrically coupled circuit modify impedance ion energy plasma controlled by
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